Tousimis AUTOSAMDRI-915B Series B Fully Automatic Critical Point Drying Instrument from the United States - Cleanroom Edition

Tousimis AUTOSAMDRI-915B Series B Fully Automatic Critical Point Drying Instrument from the United States

Fully automatic critical point dryer

Principle of critical point drying
The reason why it is called critical point drying (also known as supercritical drying) is because it has continuity of state, that is, the medium has no significant difference between liquid and gas, and the surface stress at the interface is reduced to zero. This phenomenon has a specific temperature and pressure, known as the critical point. The condition of zero surface stress can be used for drying biological samples or aqueous material samples, avoiding damage to the samples caused by surface stress.
We often need to perform dehydration treatment (gradient dehydration) when preparing biological samples or aqueous material samples under electron microscopy (scanning electron microscopy transmission electron microscopy), but the critical point of water is+374 ℃ and 3212 psi, which is inconvenient and prone to damage the sample. CO2 is usually a very convenient critical point drying medium, with a critical point at+31 ℃ and 1072 psi. However, it is not easy to mix with water, so a third medium must be used, usually ethanol or acetone as an intermediate liquid. In this way, when converting the transition liquid, i.e. CO2, from liquid to gas, there is no surface stress on the sample at the critical point.

Features and advantages

Anti static design, suitable for cleanroom material manufacturing applications; Realize fully automated processing through a microprocessor controller

All inner surface materials are resistant to environments with liquid carbon dioxide, ultra pure ethanol, and acetone

⊙ Repeatable setting of operating parameters ensures the repeatability of results

LED indication, making the operation of each program mode clear at a glance; Integrated temperature control system

Equipped with a visual window for the operator to observe the internal state of the chamber

The 0.08 μ m internal filtration system delivers clean filtered liquid CO₂To the chamber

Preset static pressure control module to automatically control system pressure and maintain pressure stability; Built in disc lobes ensure safety

The unique chamber filling block can be changed to various chamber diameters, allowing liquid CO to₂Optimizing usage efficiency and processing time

Each run can handle wafers with a diameter of 5 x 6 ", or wafers with a diameter of 5 x 4", 5 x 3 ", 5 x 2", or 5 x 10mm square die (providing HF compatible wafer/square die sample racks for easy transportation and processing of wafers and square die)

The efficient cooling system can cool the chamber from room temperature to nearly 0 ° C within 3 minutes and automatically maintain the temperature in FILL and PURGE modes

Built in SOTER ™ Condenser, separates waste ethanol and carbon dioxide, eliminates any pipeline freezing or static electricity in the body, and the entire process is noise free

Main technical indicators

➢ Working chamber diameter: 6.5 "I.D

Pressure measurement range: 0-2000psi

Temperature measurement range:- 30°C to 60°C

➢ Control mode: Fully automatic button control

conventional arrangement

✓ Flexible woven stainless steel high-pressure resistant pipe, used for transporting liquid CO2

For liquid CO2 supplied by external steel cylinders, a double T-shaped filter is used for particle filtration, with a retention rate of over 99.5%

✓ Equipped with fluorine resistant sample racks, different chamber filling blocks can be selected for drying wafer racks with diameters of 6 ", 4", 3 ", and 2", as well as 10mm square die racks. Each rack can accommodate up to 5 wafers or square dies; Equipped with 3 chamber filling blocks, the original chamber diameter can be reduced to smaller chambers of 6 ", 4", 3 ", 2", and 1.25 "

✓ Spare chamber O-ring seal, LED chamber light and fuse

Note:Tousimis products from the United States have a history of nearly 50 years and have a very good reputation among Chinese customers. Qinsi Technology is the agent of its CPD supercritical dryer in China. TousimisCritical point dryerProducts are divided intoNon cleanroom versionandCleanroom versionTwo major categories,The former is commonly used for electron microscopy sample preparation, while the latter is mostly used for material research in ultra clean rooms;

Non cleanroom versionThere are a total of 7 types of CPD:

1）Samdri ®- PVT-3D Conventional Critical Point Drying Instrument

2）Samdri ®- 795 semi-automaticCritical point dryer

3）Autosamdri ®- 815 Series A Fully Automatic Critical Point Drying Instrument

4）Autosamdri ®- 815B Series AFully automatic critical point dryer

5）Autosamdri ®- nine hundred and thirty-one_1.25"touch screenfully automaticCritical point dryer

6）Autosamdri ®- 931_2.50"touch screenfully automaticCritical point dryer

7）Autosamdri ®- 931_3.40"touch screenfully automaticCritical point dryer

Cleanroom versionThere are a total of 9 types of CPD:

1）Autosamdri ®- 815 Series BFully automatic critical point dryerFor Die & 1”Wafers

2）Autosamdri ®- 815B Series BFully automatic critical point dryerFor 4”Wafers

3）Automegasamdri ®- 915B, Series BFully automatic critical point dryer for 6 "Wafers

4）Autosamdri ®- nine hundred and thirty-one_1.25"touch screenFully automatic multi-purposeCritical point dryer

5）Autosamdri ®- 931_2.50"touch screenFully automatic multi-purposeCritical point dryer

6）Autosamdri ®- 931_3.40"Multi purpose touch screenfully automaticCritical point dryer

7）Autosamdri ®- nine hundred and thirty-fourTouchscreen C seriesfully automaticCritical point dryerFor 4”Wafers

8）Automegasamdri ®- nine hundred and thirty-sixTouchscreen C seriesfully automaticCritical point dryerFor 6”Wafers

9）Automegasamdri ®-938Touchscreen C seriesfully automaticCritical point dryerFor 8”Wafers

Tousimis supercritical dryer widely used in the United StatesIt is suitable for biological samples, gel and other fragile and complex samples with micro nano 3D structures, as well as MEMS MOF、 The critical point drying of material samples such as carbon nanotubes, graphene, and semiconductor wafers (with a maximum sample size of 8 inches, drying 5 pieces at a time). The principle of using CO2 critical point state without liquid phase surface tension to cause sample shrinkage deformation to obtain dry samples with real morphology is an effective method for drying and preparing biological samples such as cell tissues and semiconductor material samples containing water or other liquids; It has the characteristics of easy operation, precise control, and repeatable results. Among them, the classic SAMDRI ®- PVT-3D and award-winning Autosammdri ®- The 931 advanced touch screen fully automatic CPD and other models are particularly eye-catching. Customers can choose different models based on different applications.