Tousimis C-series Touch Screen Fully Automatic Critical Point Drying Device from the United States

Tousimis C-series touch screen fully automatic critical point dryer from the United States

_Wafer specific CPD (cleanroom version)

The C series is a vertical (floor standing) large-scale critical point dryer that can work in ultra clean rooms. There are three models to choose from:

1) Autosamdri-934, used for supercritical drying of wafers not exceeding 4 inches

2) Automegasamri-936, used for supercritical drying of wafers not exceeding 6 inches

3) Automegasamri-938, used for supercritical drying of wafers not exceeding 8 inches

Principle of critical point drying
The reason why it is called critical point drying (also known as supercritical drying) is because it has continuity of state, that is, the medium has no significant difference between liquid and gas, and the surface stress at the interface is reduced to zero. This phenomenon has a specific temperature and pressure, known as the critical point. The condition of zero surface stress can be used for drying biological samples or aqueous material samples, avoiding damage to the samples caused by surface stress.
We often need to perform dehydration treatment (gradient dehydration) when preparing biological samples or aqueous material samples under electron microscopy (scanning electron microscopy transmission electron microscopy), but the critical point of water is+374 ℃ and 3212 psi, which is inconvenient and prone to damage the sample. CO2 is usually a very convenient critical point drying medium, with a critical point at+31 ℃ and 1072 psi. However, it is not easy to mix with water, so a third medium must be used, usually ethanol or acetone as an intermediate liquid. In this way, when converting the transition liquid, i.e. CO2, from liquid to gas, there is no surface stress on the sample at the critical point.

Features and advantages

Specialized initial slow charging into the working chamber, ideal fluid dynamics protect sensitive microdevices

Using observation windows to achieve chamber illumination helps visualize the state of the chamber

Touchscreen control, factory default fully automatic processing program or custom user program

The inner surface material is resistant to CO_2，Ultra pure ethanol and ketone environment

External installation of Post Purge Filter and other components makes maintenance easy

Exclusive use of "spiral vortex" method to generate fluid dynamic exchange, without the need for mechanical stirring devices to accelerate displacement

Extremely efficient integrated closed cooling circuit, quickly reducing chamber temperature and shortening processing time

The working chamber filters liquid carbon dioxide particles as low as 0.08 µ m, with a particle retention rate of 99.999%+

Anti static design, suitable for cleanroom material manufacturing applications

The unique chamber filling block can achieve changes in the inner diameter of the chamber, maximize the utilization of liquid carbon dioxide, reduce process time, and provide processing capabilities for wafers of various sizes

Capable of processing up to 5 wafers at a time. Configure different HF compatible wafer supports according to different models: 8 ", 6", 4 ", 3", 2 ", and 10mm mold supports

Repetitive operating parameters ensure the reproducibility of results

Integrated temperature and pressure automatic adjustment safety operation function

Equipped with a built-in condenser, it separates waste ethanol and carbon dioxide, eliminates any pipeline freezing or static electricity in the body, and the entire process is noise free

Main technical specifications

➢ Working chamber size: 934 type 4.50 "I.D.; 936 type 6.50" I.D.; 938 type 8.50 "I.D

Pressure measurement range: 0-2000psi

Temperature measurement range:- 30°C to 60°C

➢ Control mode: Touch screen fully automatic program control

conventional arrangement

✓ Flexible high-pressure liquid CO2 supply hose, easy to install on site

✓ Double T-shaped filter assembly (# 8785) pre installed liquid carbon dioxide high-pressure hose on the chamber

✓ All exhaust outlets include anti-static exhaust pipes

✓ Chamber plugins include: 8 "to 6", 6 "to 4", 4 "to 3", 3 "to 2", 2 "to 1.25", configured according to different models! Allow drying of multiple wafer sizes

✓ Equipped with fluorine resistant sample racks, configured according to different chamber sizes for drying 8 ", 6", 4 ", 3", 2 "wafers or square bare wafers with a side length of 10mm. Each rack can hold up to five wafer wafers

✓ Spare compartment O-ring, compartment light and fuse (3A and 8A)

notes：Tousimis products from the United States have a history of nearly 50 years and have a very good reputation among Chinese customers. Qinsi Technology is the agent of its CPD supercritical dryer in China. TousimisCritical point dryerProducts are divided intoNon cleanroom versionandCleanroom versionTwo major categories,The former is commonly used for electron microscopy sample preparation, while the latter is mostly used for material research in ultra clean rooms;

Non cleanroom versionThere are a total of 7 types of CPD:

1）Samdri ®- PVT-3D Conventional Critical Point Drying Instrument

2）Samdri ®- 795 semi-automaticCritical point dryer

3）Autosamdri ®- 815 Series A Fully Automatic Critical Point Drying Instrument

4）Autosamdri ®- 815B Series AFully automatic critical point dryer

5）Autosamdri ®- nine hundred and thirty-one_1.25"touch screenfully automaticCritical point dryer

6）Autosamdri ®- 931_2.50"touch screenfully automaticCritical point dryer

7）Autosamdri ®- 931_3.40"touch screenfully automaticCritical point dryer

Cleanroom versionThere are a total of 9 types of CPD:

1）Autosamdri ®- 815 Series BFully automatic critical point dryerFor Die & 1”Wafers

2）Autosamdri ®- 815B Series BFully automatic critical point dryerFor 4”Wafers

3）Automegasamdri ®- 915B, Series BFully automatic critical point dryer for 6 "Wafers

4）Autosamdri ®- nine hundred and thirty-one_1.25"touch screenFully automatic multi-purposeCritical point dryer

5）Autosamdri ®- 931_2.50"touch screenFully automatic multi-purposeCritical point dryer

6）Autosamdri ®- 931_3.40"Multi purpose touch screenfully automaticCritical point dryer

7）Autosamdri ®- nine hundred and thirty-fourTouchscreen C seriesfully automaticCritical point dryer

8）Automegasamdri ®- nine hundred and thirty-sixTouchscreen C seriesfully automaticCritical point dryer

9）Automegasamdri ®-938Touchscreen C seriesfully automaticCritical point dryer

Tousimis supercritical dryer widely used in the United StatesIt is suitable for biological samples, gel and other fragile and complex samples with micro nano 3D structures, as well as MEMS MOF、 The critical point drying of material samples such as carbon nanotubes, graphene, and semiconductor wafers (with a maximum sample size of 8 inches, drying 5 pieces at a time). The principle of using CO2 critical point state without liquid phase surface tension to cause sample shrinkage deformation to obtain dry samples with real morphology is an effective method for drying and preparing biological samples such as cell tissues and semiconductor material samples containing water or other liquids; It has the characteristics of easy operation, precise control, and repeatable results. Among them, the classic SAMDRI ®- PVT-3D and award-winning Autosammdri ®- The 931 advanced touch screen fully automatic CPD and other models are particularly eye-catching. Customers can choose different models based on different applications.